Title : Analysis of profile of ions irradiation-induced damage in nickel nanowires done by SRIM computer simulation technique
This contribution reports on study of profile of ion beam irradiation-induced damage in nickel nanowires made by using Stopping Range of Ions in Matter (SRIM) computer simulation software. Samples of Nickel nanowires (Ni-NWs) were prepared and then exposed to different ions of different energies. Finally, a database of effects of different ions of different energies on nickel nanowires was made.
To verify SRIM results, the samples were also characterized structurally through x-ray diffraction (XRD) and transmission electron microscopy (TEM) techniques. The study of damage in Ni-NWs was performed using collision cascade theory and thermal spike’s model. This study will be helpful in application of Ni-NWs based transparent conducting electrodes (TCEs) fabricated by ion beam irradiation technique in optoelectronic devices.