HYBRID EVENT: You can participate in person at Singapore or Virtually from your home or work.

6th Edition of International Conference on

Materials Science and Engineering

March 18-20, 2024 | Singapore

Materials 2021

Marek Godlewski

Speaker at MINERALS, METALLURGY AND MATERIALS 2021 - Marek Godlewski
Institute of Physics Polish Academy of Sciences, Poland
Title : Thin films of oxides by Atomic Layer Deposition – new applications


Technology of Atomic Layer Deposition (ALD) allows to grow thin films (from a few nm to few hundred nm) of wide band gap oxides (ZnO, Al2O3, ZrO2, HfO2, TiO2) with excellent structural, mechanical, optical and electrical properties. At present such films found range of applications – as gate oxides  in Silicon-based field effect transistors (HfO2), as transparent electrodes (ZnO, ZnO:Al (AZO), Zno:Ga (GZO)) in photovoltaics, as anti-reflection layers (Al2O3) in optical and photovoltaic devices or as barrier layers (Al2O3, TiO2) in organic-based devices. Advantageous properties of ALD-deposited high-k will first be discussed. Then, quite new applications of these films in biology and medicine will be demonstrated. The same films, which were investigated by us for electronic, optoelectronic and photovoltaic applications, show bio-activities (e.g. anti-bacterial activity). This allows range of new applications in biology, medicine or food industry. Importantly, the ALD technology allows coating of temperature sensitive substrates can be coated, such as many of materials used in hospitals or in food industry. Coating of hospitals equipment and implants was tested by us.
Audience Takeaway:

New applications of wide band gap oxides in biology, medicine and/or food industry will be demonstrated. It will be discussed how the ALD technology may solve many of critical problems of our society. This includes new solutions for: 
a) green energy sources, 
b) anti-bacterial protection, 
c) production of new generation of implants.  


Professor Marek Godlewski is employed in the Institute of Physics Polish Academy of Sciences. He is head of the ON-4.2 laboratory, which develops technology of atomic layer deposition (ALD) and hydrothermal technology of oxide nanostructures. He is member of executive board of the European Materials Research Society, vice-President of the Polish Vacuum Society and was councilor of Poland in the IUVSTA. Author/coauthor of above 250 plenary and invited presentations on local and international conferences. Author/coauthor of above 30 patents and patent applications. His works are cited 6744 times, Hirsch factor 40, i10-indeks 178 (Google Scholar 9 August 2019).