Biography:
Professor Marek Godlewski is employed in the Institute of Physics Polish Academy of Sciences. He is head of the ON-4.2 laboratory, which develops technology of atomic layer deposition (ALD) and hydrothermal technology of oxide nanostructures. He is member of executive board of the European Materials Research Society, vice-President of the Polish Vacuum Society and was councilor of Poland in the IUVSTA. Author/coauthor of above 250 plenary and invited presentations on local and international conferences. Author/coauthor of above 30 patents and patent applications. His works are cited 6744 times, Hirsch factor 40, i10-indeks 178 (Google Scholar 9 August 2019).
Title : Thin films of oxides by Atomic Layer Deposition – new applications